愚愚学园 化学工程与技术 Chemical Vapour Deposition: Precursors, Processes and Applications Edition

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Chemical Vapour Deposition: Precursors, Processes and Applications Edition

Chemical Vapour Deposition: Precursors, Processes and Applications Edition
by Anthony C. Jones, Michael L. Hitchman
Chemical Vapour Deposition: Precursors, Processes and Applications Edition
By Anthony C. Jones, Michael L. Hitchman

Publisher:   Royal Society of Chemistry
Number Of Pages:   675
Publication Date:   2009-01
IN-10 / ASIN:   0854044655
IN-13 / EAN:   9780854044658
Binding:   Hardcover

The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few chapters. Then follows a detailed description of the use of a variety CVD techniques to deposit a wide range of materials, including semiconductors, metals, metal oxides and nitrides, protective coatings and functional coatings on glass. Finally and uniquely, for a technical volume, industrial and commercial aspects of CVD are also discussed together with possible future trends, which is an unusual, but very important aspect of the book.