【 作者】Emmanuel A. Baisie 【文章标题】Pad conditioning in chemical mechanical polishing: a conditioning density distribution model to predict pad surface shape 【期刊名,年份,卷(期),起止页*****】 International Journal of Manufacturing Research 【全文链接】http://www.inderscienceonline.com/doi/abs/10.1504/IJMR.2013.051836